An Iterative Learning Control In Rapid Thermal Processing
نویسندگان
چکیده
This paper presents an application of Iterative Learning Control (ILC) methodology to the temperature proole control of a Rapid Thermal Processing (RTP) system for single wafer processing (SWP), a trend in semiconductor manufacturing. The motivation and the basic ideas are brieey introduced. The eeectiveness of the proposed method is demonstrated by the simulation studies of a simpliied model of rapid thermal processing of chemical vapor deposition (RTPCVD).
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